发明名称 |
SUBSTRATE, SEMICONDUCTOR DEVICE USING THE SAME, METHOD FOR INSPECTING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
A substrate, a semiconductor device using the same, a method for inspecting the semiconductor device, and a method for manufacturing the semiconductor device are provided to reduce a mounting area, signal wiring capacity, and noise by improving a structure thereof. A substrate including at least one semiconductor stacked circuit is formed in a substrate stacked through an insulating layer. The substrate includes a first electrode terminal(13) connected to the semiconductor stacked circuit, a second electrode terminal(14) connected to a terminal of an upper substrate arranged on an upper layer of the substrate, and a third electrode terminal(15) positioned at an outside of an extension of the upper substrate in a part of outer circumferences of the first and second electrode terminals. |
申请公布号 |
KR20080041999(A) |
申请公布日期 |
2008.05.14 |
申请号 |
KR20070112537 |
申请日期 |
2007.11.06 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
IWAMURA HIROKI;OZAWA NAOTO;HIRAI HIROSHI |
分类号 |
H01L23/48 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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