发明名称 Method for growing a compound semiconductor layer on a metal layer
摘要 <p>The present invention relates to a compound semiconductor substrate and a method for manufacturing the same. The present invention provides the manufacturing method which coats spherical balls on a substrate, forms a metal layer between the spherical balls, removes the spherical balls to form openings, and grows a compound semiconductor layer from the openings. According to the present invention, the manufacturing method can be simplified and grow a high quality compound semiconductor layer rapidly, simply and inexpensively, as compared with a conventional ELO (Epitaxial Lateral Overgrowth) method or a method for forming a compound semiconductor layer on a metal layer. And, the metal layer serves as one electrode of a light emitting device and a light reflecting film to provide a light emitting device having reduced power consumption and high light emitting efficiency.</p>
申请公布号 EP1921668(A2) 申请公布日期 2008.05.14
申请号 EP20070120215 申请日期 2007.11.07
申请人 SILTRON INC. 发明人 KIM, YONG-JIN;KIM, DOO-SOO;LEE, HO-JUN;LEE, DONG-KUN
分类号 H01L21/20;H01L33/12;H01L33/32;H01L33/38;H01L33/44;H01S5/02 主分类号 H01L21/20
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