发明名称 |
Laser, irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device |
摘要 |
Providing a method and apparatus for efficiently irradiating a uniform laser light on an irradiation surface even when a laser light of high coherence or a large size substrate is used. The laser irradiation apparatus of the invention comprises a laser; means for dividing a laser light emitted from the laser into plural laser beams; means for synthesizing the laser beams on the irradiation surface or place in the vicinity thereof thereby forming a laser light having a periodical energy distribution; and means for moving the substrate relative to the laser light. Such a laser irradiation apparatus may be used to anneal the overall surface of a semiconductor film.
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申请公布号 |
US7372630(B2) |
申请公布日期 |
2008.05.13 |
申请号 |
US20020217477 |
申请日期 |
2002.08.14 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TANAKA KOICHIRO |
分类号 |
G02B27/10;G02B27/09 |
主分类号 |
G02B27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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