Positive photosensitive resin composition

摘要

A positive photosensitive resin composition comprising (A) a polyamic acid, (B) a 1,4-dihydropyridine derivative represented by the general formula (II): wherein R² is a monovalent organic group; each of R³, R⁴, R⁵, and R⁶ is independently hydrogen or a monovalent organic group; and Ar-NO₂ is an aromatic hydrocarbon group having a nitro group at ortho-position, and (C) an amine compound.