| 摘要 |
An image sensor and a manufacturing method thereof are provided to improve sensitivity of the image sensor by effectively delivering an incident beam to a photodiode region. An image sensor includes a protective film(23), a reflection ratio adjusting layer(31), a color filter array(25), a planarization layer(27), and a microlens(29). A light reception portion is formed at a lower portion of the protective film. The reflection ratio adjusting layer is formed on the protective film. The color filter array is formed on the reflection ratio adjusting layer. The planarization layer is formed on the color filter array. The microlens is formed on the planarization layer. A refractive index of the reflection ratio adjusting layer lies between those of the protective film and the color filter array.
|
