发明名称 |
Removal of transition metal ternary and/or quaternary barrier materials from a substrate |
摘要 |
A process for the selective removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance from a substrate comprising: providing the substrate having the substance deposited thereupon wherein the substance comprises a transition metal ternary compound, a transition metal quaternary compound, and combinations thereof; reacting the substance with a process gas comprising a fluorine-containing gas and optionally an additive gas to form a volatile product; and removing the volatile product from the substrate to thereby remove the substance from the substrate.
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申请公布号 |
US7371688(B2) |
申请公布日期 |
2008.05.13 |
申请号 |
US20040942301 |
申请日期 |
2004.09.15 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
JI BING;PLISHKA MARTIN JAY;WU DINGJUN;BADOWSKI PETER RICHARD;KARWACKI, JR. EUGENE JOSEPH |
分类号 |
H01L21/302;C23C16/44;C23G5/00;H01L21/3213;H01L21/44;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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