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发明名称
APPARATUS FOR CLEANING PATTERN MASK AND EXPOSURE EQUIPMENT HAVING THE SAME
摘要
申请公布号
KR100828522(B1)
申请公布日期
2008.05.13
申请号
KR20020039128
申请日期
2002.07.06
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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