发明名称 SOI chip with recess-resistant buried insulator and method of manufacturing the same
摘要 A semiconductor-on-insulator structure includes a substrate and a buried insulator stack overlying the substrate. The buried insulator stack includes a first dielectric layer and a recess-resistant layer overlying the first dielectric layer. A second dielectric layer can overlie the recess-resistant layer. A semiconductor layer overlying the buried insulator stack. Active devices, such as transistors and diodes, can be formed in the semiconductor layer.
申请公布号 US7372107(B2) 申请公布日期 2008.05.13
申请号 US20050207681 申请日期 2005.08.19
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 YEO YEE-CHIA;HU CHENMING
分类号 H01L23/62;H01L21/20;H01L21/31;H01L21/762;H01L21/84;H01L27/01;H01L27/12 主分类号 H01L23/62
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