发明名称 |
METHOD FOR COLD PROCESS DEPOSITION OF AN ANTIGLARE LAYER |
摘要 |
The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF<SUB>2 </SUB>( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF<SUB>2 </SUB>layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses. |
申请公布号 |
PT1339893(E) |
申请公布日期 |
2008.05.13 |
申请号 |
PT20010998671T |
申请日期 |
2001.11.26 |
申请人 |
ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE |
发明人 |
YVON HELMSTETTER;JEAN-DANIEL BERNHARD;FREDERIC ARROUY |
分类号 |
C23C14/06;B32B7/02;G02B1/00;G02B1/11 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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