| 摘要 |
A substrate attaching device ( 3 ) includes a vacuum chamber ( 31 ), a first electrostatic chuck ( 32 ) at least partly set in the vacuum chamber, and further includes a chuck body ( 321 ) with a plurality of gas releasing holes ( 322 ), a working table ( 33 ) stationable below the first electrostatic chuck in the vacuum chamber, a gas supply ( 34 ) communicating with the gas releasing holes, a pump device ( 35 ) communicating with the vacuum chamber, and a sub-vacuum ( 37 ) chamber communicating with both the vacuum chamber and the pump device.
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