发明名称 PROCESS FOR PREPARING PLASTIC SUBSTRATE
摘要 A method for fabricating a plastic substrate is provided to improve cohesion of a plastic substrate and an inorganic thin film by adjusting the deposition temperature of plasma. A complex inorganic precursor including hydrogen carbon and reaction gas are deposited on one or both surfaces of a transparent plastic base film(15) to form an inorganic thin film by a plasma chemical deposition method. The process for forming the inorganic thin film is performed in a condition that the deposition temperature in a plasma chamber is increased. The deposition temperature can range from 10 °C to 220 °C, and the deposition temperature increases continuously or discontinuously.
申请公布号 KR20080041399(A) 申请公布日期 2008.05.13
申请号 KR20060109450 申请日期 2006.11.07
申请人 SAMYANG CORPORATION 发明人 JANG, IN BAE;CHOI, SEUNG RYUL;KIM, SUN WOOK
分类号 H01L21/84;H01L21/205 主分类号 H01L21/84
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