发明名称 CRUCIBLE FOR SILICON CARBIDE EPITAXY
摘要 FIELD: chemistry; processes to manufacture silicon carbide monocrystals by gaseous epitaxy. ^ SUBSTANCE: crucible comprises body and cover with pedestal, the cover being provided with concentric slots for heat-transfer elements. The latter increase temperature of cover surface portion, on which polycrystals grow, thus retarding their growth. As a result, SiC monocrystal being grown starts to grow also in direction 90 degrees to (0001) face, using polycrystal surface as pedestal extension. ^ EFFECT: in a few cycles, monocrystal diameter extends over the whole cover surface and continues to increase in height, despite of parasitic polycrystalline growth around. ^ 2 dwg
申请公布号 RU2324019(C2) 申请公布日期 2008.05.10
申请号 RU20060115108 申请日期 2006.05.02
申请人 BILALOV BILAL ARUGOVICH 发明人 BILALOV BILAL ARUGOVICH;SAFARALIEV GADZHIMET KERIMOVICH;GITIKCHIEV MAGOMED AKHMEDOVICH
分类号 C30B23/00;C30B29/36 主分类号 C30B23/00
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