OPTICAL ELEMENT, LIQUID IMMERSION EXPOSURE APPARATUS, LIQUID IMMERSION EXPOSURE METHOD, AND METHOD FOR PRODUCING MICRO DEVICE

摘要

An optical element used such that at least one surface thereof is in contact with a liquid in a liquid immersion exposure apparatus in which a substrate is exposed by exposure light illuminated on the substrate via the liquid with a refraction index in a range between 1.60 and 1.66 to the light with a wavelength of 193 nm, comprising: a base material with a refraction index in a range between 2.10 and 2.30 to the light with a wavelength of 193 nm; and a first antireflection film formed on the contact surface between the base material and the liquid, wherein the first antireflection film includes a first antireflection layer with a refraction index in a range between 1.80 and 2.02 to the light with a wavelength of 193 nm and an optical film thickness in a range between 0.25? and 0.42? to the wavelength ? of the exposure light, a second antireflection layer with a refraction index in a range between 1.65 and 1.77 to the light with a wavelength of 193 nm and an optical film thickness in a range between 0.10? and 0.45? to the wavelength ? of the exposure light, and the first antireflection layer and the second antireflection layer are sequentially laminated in an order from the base material side.