摘要 |
<p>The method involves transferring a layout to a photo-sensitive foil (11) from plastic material by selective exposure of the photo-sensitive foil, and applying the selectively exposed foil on a surface of a substrate (10), where the photo-sensitive foil has a two-dimensional extension during the exposure. The transmission of the layout takes place using a mask, and sections (21a, 21b, 21c) of the photo-sensitive foil are shadowed by the mask, in whose place the conductive structure is designed.</p> |