发明名称 NEUTRAL PARTICLE BEAM TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a charge-free and damage-free neutral particle beam treatment device which can radiate beams of large diameters to a treatment object and can obtain a high neutralization ratio by an economical and compact constitution. <P>SOLUTION: The neutral particle beam treatment device is provided with a holding part 20 to hold a treatment object X, a plasm generating part which repeats alternately the application and stop of a high-frequency voltage and generates plasma containing positive ions and negative ions in a vacuum chamber 3, an orifice electrode 4 which is placed in the vacuum chamber and arranged between the plasma generating part and the treatment object and shields ultraviolet rays emitted from the plasma, a grid electrode 5 arranged in an upper stream with respect to the orifice electrode in the vacuum chamber, and a bipolar power source 102 which applies a voltage between the orifice electrode and the grid electrode and takes out alternately the positive ions and the negative ions from the plasma generated in the plasma generating part. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008108745(A) 申请公布日期 2008.05.08
申请号 JP20070326831 申请日期 2007.12.19
申请人 EBARA CORP 发明人 ICHIKI KATSUNORI;YAMAUCHI KAZUO;HIYAMA HIROKUNI;SAGAWA SEIJI
分类号 H05H1/46;B01J19/08;H01L21/3065;H01L21/31;H05H3/00 主分类号 H05H1/46
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