发明名称 |
OHMIC ELECTRODE FOR SIC SEMICONDUCTOR, METHOD FOR MANUFACTURE OF OHMIC ELECTRODE FOR SIC SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHODFOR MANUFACTURE OF SEMICONDUCTOR DEVICE |
摘要 |
Disclosed are: an ohmic electrode (2) for a SiC semiconductor, comprising Si and Ni, or an ohmic electrode (2) for a SiC semiconductor, comprising Si and Ni and additionally comprising Au or Pt; a method for manufacturing the ohmic electrode (2); a semiconductor device using the ohmic electrode (2); and a method for manufacturing the semiconductor device. |
申请公布号 |
CA2667648(A1) |
申请公布日期 |
2008.05.08 |
申请号 |
CA20072667648 |
申请日期 |
2007.08.13 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
TAMASO, HIDETO;FUJIKAWA, KAZUHIRO |
分类号 |
H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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