发明名称 OHMIC ELECTRODE FOR SIC SEMICONDUCTOR, METHOD FOR MANUFACTURE OF OHMIC ELECTRODE FOR SIC SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHODFOR MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 Disclosed are: an ohmic electrode (2) for a SiC semiconductor, comprising Si and Ni, or an ohmic electrode (2) for a SiC semiconductor, comprising Si and Ni and additionally comprising Au or Pt; a method for manufacturing the ohmic electrode (2); a semiconductor device using the ohmic electrode (2); and a method for manufacturing the semiconductor device.
申请公布号 CA2667648(A1) 申请公布日期 2008.05.08
申请号 CA20072667648 申请日期 2007.08.13
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 TAMASO, HIDETO;FUJIKAWA, KAZUHIRO
分类号 H01L21/28 主分类号 H01L21/28
代理机构 代理人
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