发明名称 SEMICONDUCTOR DEVICES AND FABRICATION PROCESS THEREOF
摘要 A semiconductor device has an insulated gate transistor provided with a semiconductor substrate and a gate electrode arranged on the semiconductor substrate via a gate insulating film. The gate electrode includes an electrically-conductive buffer film for preventing any damage, which would occur if a main gate electrode portion were formed directly over the gate insulating film, and the main gate electrode portion formed over the buffer film. A fabrication process for the semiconductor device is also disclosed.
申请公布号 US2008105920(A1) 申请公布日期 2008.05.08
申请号 US20070682586 申请日期 2007.03.06
申请人 HIRANO TOMOYUKI;TAI KAORI 发明人 HIRANO TOMOYUKI;TAI KAORI
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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