发明名称 |
SEMICONDUCTOR DEVICES AND FABRICATION PROCESS THEREOF |
摘要 |
A semiconductor device has an insulated gate transistor provided with a semiconductor substrate and a gate electrode arranged on the semiconductor substrate via a gate insulating film. The gate electrode includes an electrically-conductive buffer film for preventing any damage, which would occur if a main gate electrode portion were formed directly over the gate insulating film, and the main gate electrode portion formed over the buffer film. A fabrication process for the semiconductor device is also disclosed.
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申请公布号 |
US2008105920(A1) |
申请公布日期 |
2008.05.08 |
申请号 |
US20070682586 |
申请日期 |
2007.03.06 |
申请人 |
HIRANO TOMOYUKI;TAI KAORI |
发明人 |
HIRANO TOMOYUKI;TAI KAORI |
分类号 |
H01L21/336;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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