| 摘要 |
PROBLEM TO BE SOLVED: To reduce vibration in the body of an aligner effectively for the support structure of the aligner supporting the aligner, and the aligner. SOLUTION: The body of the aligner in which equipment for exposure is arranged is supported on a building foundation via a pedestal for the body. Auxiliary equipment as a vibration source is supported on the building foundation via a support means independent of the pedestal. The equipment for exposure includes a reticle stage, a projection optical system, and a wafer stage. COPYRIGHT: (C)2008,JPO&INPIT
|
