| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter by which the overlapped width of a black matrix with the color filter is reduced by mask-less laser exposure and alignment to match the edge condition can be performed, thereby the color filter having high transmittance can be formed. <P>SOLUTION: The method of manufacturing the color filter comprises a black matrix forming step and a pixel forming step for forming pixels for each color of at least R, G and B on the surface of a base material formed with the black matrix. An exposure step in the pixel forming step is a step for exposing a photosensitive layer by designating an imaging portion used for N-fold exposure (N is natural number of ≥2) and moving an exposure head relatively to the photosensitive layer in the scanning direction and the relationship (B)/(A) of the overlapped width (A) between the formed pixel and the black matrix and the width (B) of the black matrix is higher than 2. <P>COPYRIGHT: (C)2008,JPO&INPIT |
