发明名称 PATTERN CORRECTION DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern correction device capable of mounting a test substrate with ease. <P>SOLUTION: The pattern correction device comprises: a Y-axis table 9 on which a glass substrate 6 to be corrected is mounted when defect correction to correct the open defect 41a of an electrode 41 is carried out; a sub-table 43 on which the test substrate 42 is mounted when a test for setting the application condition of a correction paste 40 is conducted; and a correction liquid application mechanism 4 which applies the correction paste 40 to the open defect 41a when the defect correction is carried out and applies the correction paste 40 to the test substrate 42 when the test is conducted. Thus, by preparing the sub-table 43 at a position close to the outside of the device, the test substrate 42 can be easily mounted on the sub-table 43. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008107625(A) 申请公布日期 2008.05.08
申请号 JP20060291266 申请日期 2006.10.26
申请人 NTN CORP 发明人 MIYASHITA YOSHIMASA
分类号 G09F9/00;B05C13/02;G02F1/13;H01J9/50 主分类号 G09F9/00
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