| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaluation method and evaluation apparatus for a semiconductor wafer capable of evaluating the surface structure of a semiconductor wafer having a level difference (step) structure whose flat surface (terrace) is a crystal plane within a short time on a wide range. SOLUTION: The evaluation method for a semiconductor wafer having a level difference (step) structure whose flat surface (terrace) is a crystal plane comprises a procedure of irradiating the semiconductor wafer by scanning the surface thereof with a near-field light, a procedure of receiving the Raman scattering light generated from the semiconductor wafer, a procedure of deriving the Raman spectrum by analyzing the received Raman scattering light with a spectrometer, and a procedure of calculating the width of the flat surface (terrace width) from the derived Raman spectrum, while the evaluation apparatus achieves the method thereof. COPYRIGHT: (C)2008,JPO&INPIT
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