| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicon wafer having a flat surface of atomic level suitable for downscaling of LSI, and to provide its production process. SOLUTION: Assuming an arbitrary region of 3μm×3μm on the surface of the silicon wafer is the measuring region of an atomic force microscope (AFM) in a silicon wafer having such a level difference (step) structure as the flat surface (terrace) is a crystalline plane, 90% or more of measurements of the width (terrace width) of the flat surface measured along ten measuring lines at an interval of about 0.3μm in the direction substantially perpendicular to the level difference is 50 nm or above in the measuring region, and 90% or more of measurements of the height (step height) of the level difference measured along ten measuring lines in the direction substantially perpendicular to the level difference is equal to the height of one atomic layer in the measuring region. COPYRIGHT: (C)2008,JPO&INPIT
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