发明名称 METHOD OF MANUFACTURING LIQUID EJECTION HEAD
摘要 PROBLEM TO BE SOLVED: To realize reduction in the cost of manufacturing a liquid ejection head in which the pressure chamber is simultaneously arranged at high density, while securing the shape, dimensions and dimensional accuracy of the restrictor. SOLUTION: Two first spaces having two opposing planes (111) and two inclined planes(111) in the wall surfaces, being perpendicular with respect to the surface of a silicon substrate in crystal plane orientation (110), are formed for the liquid supply channel and the pressure chamber by performing anisotropic etching. An etching protective film in the silicon substrate with the two first spaces formed thereon, is formed. An etching mask is made for forming second spaces for the restrictor having two inclined planes (111) in the wall surfaces with respect to the surface of the silicon substrate, which interconnect the two first spaces. The second spaces are formed by performing anisotropic etching, using the etching mask. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008105418(A) 申请公布日期 2008.05.08
申请号 JP20070252248 申请日期 2007.09.27
申请人 FUJIFILM CORP 发明人 SUGIMOTO SHINYA
分类号 B41J2/045;B41J2/055;B41J2/16 主分类号 B41J2/045
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