发明名称 METHOD OF WORKING SOLID SURFACE WITH GAS CLUSTER ION BEAM
摘要 <p>A method of working a solid surface while avoiding any deformation of corner portion of nonflat structure. There is provided a method of working a solid surface with gas cluster ion beams, comprising the cluster protection layer forming step of forming on a solid surface a nonflat structure composed of a protrudent portion coated at its top with a cluster protection layer and a depressed portion not coated with a cluster protection layer; the irradiation step of irradiating the solid surface having the nonflat structure formed in the cluster protection layer forming step with gas cluster ion beams; and the removing step of removing the cluster protection layer. The thickness of the cluster protection layer, T, satisfies the relationship of the formula (I): wherein n is the dose of gas cluster ion beams and wherein the efficiency of etching of the cluster protection layer is referred to as etching volume, Y, per cluster (provided that a and b are constants).</p>
申请公布号 WO2008054013(A1) 申请公布日期 2008.05.08
申请号 WO2007JP71459 申请日期 2007.10.30
申请人 JAPAN AVIATION ELECTRONICS INDUSTRY LIMITED;KYOTO UNIVERSITY;SUZUKI, AKIKO;SATO, AKINOBU;BOURELLE, EMMANUEL;MATSUO, JIRO;SEKI, TOSHIO 发明人 SUZUKI, AKIKO;SATO, AKINOBU;BOURELLE, EMMANUEL;MATSUO, JIRO;SEKI, TOSHIO
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
主权项
地址