发明名称 ALKALI SOLUBLE POLYMER AND POSITIVE WORKING PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME
摘要 An alkali-soluble polymer, and a positive photosensitive resin composition containing the polymer are provided to improve solvent resistance, water fastness, acid resistance, alkali resistance, heat resistance, transparency and the adhesion to a substrate. An alkali-soluble polymer is obtained by polymerizing a monomer represented by the formula 1 or by copolymerizing the monomer represented by the formula 1 and other radical polymerizable monomer, wherein R1, R2 and R3 are H, or a C1-C3 alkyl group capable of being substituted with F, respectively; R4, R5, R6, R7 and R8 are H, a halogen atom, CN, CF3, OCF3, OH, a C1-C5 alkyl group whose -CH2- can be substituted with -COO-, -OCO- or -CO-, or a C1-C5 alkoxy group whose H can be substituted with a halogen atom; and at least one of R4 to R8 is OH.
申请公布号 KR20080040569(A) 申请公布日期 2008.05.08
申请号 KR20070104403 申请日期 2007.10.17
申请人 CHISSO CORPORATION 发明人 ETOU TOMOHIRO;WATANABE EIJI;MINEO RYOUTA
分类号 C08F20/00;C08F265/04;G03C1/76 主分类号 C08F20/00
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