| 摘要 |
<p>A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source (32), a power converter (72) receiving power from the source (32), the power converter (72) providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator (75) receiving constant power from the power converter.</p> |
