TIN OXIDE-BASED SPUTTERING TARGET, LOW RESISTIVITY, TRANSPARENT CONDUCTIVE FILM, METHOD FOR PRODUCING SUCH FILM AND COMPOSITION FOR USE THEREIN

摘要

The present invention is directed to a composition consisting essentially of: a) from about 60 to about 99 mole% of SnO₂, and b) from about 1 to about 40 mole% of one or more materials selected from the group consisting of i) Nb₂O₅, ii) NbO, iii) NbO_2, iv) WO₂, v) a material selected consisting of a) a mixture of MoO₂ and Mo and b) Mo, vi) W, vii) Ta₂O₅, and viii) mixtures thereof, wherein the mole %s are based on the totai product and wherein the sum of components a) and b) is 100. The invention is aiso directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition.