发明名称 APPARATUS FOR PROCESSING SUBSTRATE
摘要 A substrate processing apparatus is provided to spray a processing solution from a spray nozzle according as a servo motor and a fluid supply pipe are rotated, thereby varying spraying directions and uniformly spraying the solution even onto a substrate where a three-dimensional structure is formed. A fluid supply pipe(200) supplies fluid to a substrate(s) within a chamber(100). One or more spray nozzles(300) are installed as being connected to the fluid supply pipe. A rotating unit rotates the fluid supply pipe on the plane of an upper part within the chamber. The rotating unit comprises a servo motor(230) and a magnetic driving shaft(220). The servo motor provides rotating force for rotating the fluid supply pipe, and includes a magnetic substance. The magnetic driving shaft is disposed to face the magnetic substance, and rotates the fluid supply pipe according to rotation of the servo motor by the magnetic force formed between the magnetic substance and the magnetic driving shaft. The fluid is sprayed on the substrate through spray holes(310) of the spray nozzles.
申请公布号 KR100828424(B1) 申请公布日期 2008.05.08
申请号 KR20060138009 申请日期 2006.12.29
申请人 SEMES CO., LTD. 发明人 LEE, BYOUNG OU
分类号 G02F1/13;B08B3/02;B08B3/04 主分类号 G02F1/13
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