PROCESSING/OBSERVING DEVICE, AND PROCESSING/OBSERVING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a processing/observing device of a semiconductor that can reduce time spent for drawing processing and has high precision in the processing/observation of a sample. SOLUTION: The processing/observing device of a semiconductor comprises: a processing device irradiating ion beams for drawing processing including Ga ion beams; a scanning electron microscope device irradiating electron beams; a powder removing device irradiating ion beams for powder removal including Ar ion beams; a vacuum vessel storing the three devices together; and a placement table that is placed in the vacuum vessel and places a sample. The processing/observing device is arranged so that each beam emitted by the three devices gathers at the sample, has a detector detecting secondary electrons generated from the sample with the irradiation of electron beams, and allows the acceleration voltage of the scanning electron microscope device irradiating electron beams to be approximately 0.6-3 keV. COPYRIGHT: (C)2008,JPO&INPIT