发明名称 DOUBLE-STACKED EBG STRUCTURE
摘要 <p>In a double-stacked electromagnetic bandgap (EBG) structure, a first conductive plane and a second conductive plane are spaced apart in parallel. At least two EBG layers are embedded in parallel between the first conductive plane and the second conductive plane. The at least two EBG layers have different stopband characteristics. A plurality of vias connect the at least two EBG layers respectively to one of the first and second conductive planes. At least the vias connecting one of the EBG layers pass through via holes in cells of another EBG layer.</p>
申请公布号 WO2008054324(A1) 申请公布日期 2008.05.08
申请号 WO2006SG00322 申请日期 2006.11.01
申请人 AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH;PARK, JONGBAE;LU, CHEE WAI ALBERT;KIM, JOUNGHO 发明人 PARK, JONGBAE;LU, CHEE WAI ALBERT;KIM, JOUNGHO
分类号 H01L23/14;H01L21/02;H01L23/52 主分类号 H01L23/14
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