| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a means for evaluating a substrate mounting apparatus simply, by forming a pseudo thermal status corresponding to actual plasma processing apparatus with respect to an imitation evaluation device which evaluates performance of the substrate mounting apparatus by using an infrared heater as a heat source. <P>SOLUTION: In the evaluation device of the substrate mounting apparatus, a substrate to be set on an installation stage is fixed and subjected to temperature control. The evaluation device of the substrate mounting apparatus includes an air-tight chamber, which can be decompressed, for installing the substrate mounting apparatus inside; a heat source provided opposite to the installation stage for casting infrared ray; and an evaluation substrate made of material, which absorbs infrared ray, mounted on the mounting stage instead of the substrate to be treated, and having a means for measuring two or more spots of the surface and the interior. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
