发明名称 |
POLISHING DEVICE FOR DISC-LIKE SUBSTRATE, AND DISC-LIKE SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To polish the inner periphery of a disc-like substrate with high precision by suppressing occurrence of run-out in the rotation of a polishing brush. SOLUTION: The polishing device is provided with: a substrate holder 50 for stacking and holding the disc-like substrates having a hole at the center each; the brush 60 for polishing the hole in the disc-like substrate stacked in the substrate holder 50; a first rotary shaft 71 to which one end of a shaft 63 of the brush 60 is fixed; a second rotary shaft 72 which is provided apart from the first rotary shaft 71 and to which the other end of the brush 60 is fixed; and an energizing means for moving the first rotary shaft 71 and/or the second rotary shaft 72 in the axial direction to give tensile force in the axial direction of a core to the core. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008105159(A) |
申请公布日期 |
2008.05.08 |
申请号 |
JP20060292553 |
申请日期 |
2006.10.27 |
申请人 |
SHOWA DENKO KK;CITIZEN SEIMITSU CO LTD |
发明人 |
HANEDA KAZUYUKI;WATANABE KUNIZO |
分类号 |
B24B29/00;B24B5/06;B24B5/50;B24B9/00;C03C19/00;G11B5/84 |
主分类号 |
B24B29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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