发明名称 PRECISION HIGH-FREQUENCY CAPACITOR FORMED ON SEMICONDUCTOR SUBSTRATE
摘要 A method of fabricating a capacitor in a semiconductor substrate. The semiconductor substrate is doped to have a low resistivity. A second electrode, insulated from a first electrode, is formed over a front side surface and connected by a metal-filled via to the back side surface. The via may be omitted and the second electrode may be in electrical contact with the substrate or may be formed on top of the dielectric layer, yielding a pair of series-connected capacitors. ESD protection for the capacitor is provided by a pair of oppositely-directed diodes formed in the substrate connected in parallel with the capacitor. Capacitance is increased while maintaining a low effective series resistance. Electrodes include a plurality of fingers, which are interdigitated with the fingers of other electrode. The capacitor is fabricated in a wafer-scale process with other capacitors, where capacitors are separated from each other by a dicing technique.
申请公布号 US2008108202(A1) 申请公布日期 2008.05.08
申请号 US20070966965 申请日期 2007.12.28
申请人 VISHAY-SILICONIX 发明人 GOLDBERGER HAIM;LUI SIK;KOREC JACEK;KASEM Y. M.;WONG HARIANTO;VAN DEN HEUVEL JACK
分类号 H01L21/283 主分类号 H01L21/283
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