BAFFLED LINER COVER

摘要

A baffled liner cover (40) supported at the top of a liner (20) surrounding a wafer support tower (22) for semiconductor thermal processing. The cover may present a continuous horizontal surface for preventing particles from falling within the liner but present horizontal extending gas passageways (50) in a baffle assembly to allow the flow of processing gas through the cover. In one embodiment, a baffle assembly (51) includes a cup-shaped member (62) disposed in a central aperture of a top plate (26) of the tower and having an open top, a continuous bottom (62), horizontal holes (60) through the sides, and a rim (64) around its sides defining a convolute annular passage. Alternatively, the planar top plate may included slanted holes (1 16, 122) therethrough or vertical holes (136) occupying a small fraction of the surface area. The liner and cover may be composed of quartz, silicon carbide, or preferably silicon.