CLEANING APPARATUS, CLEANING SYSTEM USING THE SAME, AND METHOD OF CLEANING SUBSTRATE TO BE CLEANED

摘要

PROBLEM TO BE SOLVED: To provide a cleaning apparatus wherein atmosphere within a chamber can be stabilized to prevent any trouble generated in the conventional manner. SOLUTION: The cleaning apparatus is used to clean a substrate 2 to be cleaned such as a semiconductor substrate, a liquid crystal glass substrate, a magnetic disk, etc. in a container 3. It is provided with means 5, 21, and 31 to supply air, an inert gas or the like into the container 3 and a means to discharge the air or inert gas from the container 3. The means to discharge the air or inert gas is provided with a pressure control mans 7B to control the pressure of the container 3. The pressure control means 7B includes a control valve 7A to control its opening according to the detected value of a pressure gauge 7C. COPYRIGHT: (C)2008,JPO&INPIT