发明名称 THIN FILM FUSE PHASE CHANGE RAM AND MANUFACTURING METHOD
摘要 A memory device comprising a first electrode having a top side, a second electrode having a top side and an insulating member between the first electrode and the second electrode. The insulating member has a thickness between the first and second electrodes near the top side of the first electrode and the top side of the second electrode. A bridge of memory material crosses the insulating member, and defines an inter-electrode path between the first and second electrodes across the insulating member. An array of such memory cells is provided. In the array, a plurality of electrode members and insulating members therebetween comprise an electrode layer on an integrated circuit. The bridges of memory material have sub-lithographic dimensions.
申请公布号 US2008105862(A1) 申请公布日期 2008.05.08
申请号 US20070959708 申请日期 2007.12.19
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LUNG HSIANG LAN;CHEN SHIH-HUNG
分类号 H01L45/00 主分类号 H01L45/00
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