| 摘要 |
A plasma processing system (100) for processing a planar workpiece is provided that has the capability of changing the rotational position of a workpiece relative to a plasma processing chamber of the system. The system workpiece transfer apparatus is coupled to the reactor chambers (102, 104, 106, 108) of the system. The workpiece transfer apparatus is capable of transferring workpieces to and from each of the chambers. The system further includes a factory interface (120) coupled to the workpiece transfer apparatus for transferring workpieces from and to a factory environment external of the plasma processing system. The factory interface includes (a) a frame defining an internal volume, (b) a rotatable and translatable arm (134) supported on the frame within the internal volume, (c) a workpiece-handling blade (126) attached to an outer end of the arm, and (d) a stationary workpiece-holding support bracket (140, 160) that facilitates rotation of a workpiece.
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