摘要 |
An atomic force microscope apparatus and a method of measuring electrical characteristics using the same are provided to perform a fine machining process using an etching tip having etchant. An atomic force microscope apparatus includes a support part and a storage part. The support part has a multi-layered structure including a first silicon nitride layer(110), a first oxide layer(108), a silicon substrate(100), a second oxide layer(112), and a second silicon layer(114). The storage part has a multi-layered structure including the first oxide layer, the silicon substrate, the second oxide layer, and the second silicon nitride layer. The storage part has a hole-shaped contact part such that the etchant stored in the storage part flows out. |