发明名称 Photo-curable resin composition
摘要 The invention relates to a radiation curable composition comprising from about 50 wt% to about 70 wt% of a cycloaliphatic diepoxide, from about 5 wt% to about 15 wt% of a polyol, from about 5 wt% to about 15 wt% of an oxetane, from about 10 wt% to about 20 wt% of an aromatic diacrylate, a radical photoinitiator and a cationic photoinitiator. The invention further relates to a process for making a three dimensional article from the resin composition of the invention, to the three-dimensional article itself and to the use of the composition of the invention.
申请公布号 EP1918316(A1) 申请公布日期 2008.05.07
申请号 EP20070119667 申请日期 2007.10.30
申请人 DSM IP ASSETS B.V. 发明人 XU, JIGENG
分类号 C08G59/00 主分类号 C08G59/00
代理机构 代理人
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