发明名称 SEMICONDUCTOR SUBSTRATE CUTTING METHOD
摘要 <p>A semiconductor substrate cutting method which can efficiently cut a semiconductor substrate having a front face formed with a functional device together with a die bonding resin layer is provided. A wafer 11 having a front face 3 formed with a functional device 15 is irradiated with laser light L while positioning a light-converging point P within the wafer 11 with the rear face 17 of the wafer 11 acting as a laser light incident face, so as to generate multiphoton absorption, thereby forming a starting point region for cutting 8 due to a molten processed region 13 within the wafer 11 along a line along which the substrate should be cut 5. Consequently, a fracture can be generated from the starting point region for cutting 8 naturally or with a relatively small force, so as to reach the front face 3 and rear face 17. Therefore, when an expansion film 21 is attached to the rear face 17 of the wafer 11 by way of a die bonding resin layer 23 after forming the starting point region for cutting 8 and then expanded, the wafer 11 and die bonding resin layer 23 can be cut along the line along which the substrate should be cut 5.</p>
申请公布号 KR100827879(B1) 申请公布日期 2008.05.07
申请号 KR20067004943 申请日期 2006.03.10
申请人 发明人
分类号 H01L21/301;B23K26/08;B23K26/10;B23K26/40 主分类号 H01L21/301
代理机构 代理人
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