Device for forming a film by deposition from a plasma
摘要
A plasma excitation device is described for use in depositing a film on a substrate from a plasma formed by distributed electron cyclotron resonance. The device comprises a microwave antenna having an end from which microwaves are emitted, a magnet disposed in the region of the said antenna end and defining therewith an electron cyclotron resonance region in which a plasma can be generated, and a gas entry element having an outlet for a film precursor gas or a plasma gas. The outlet is arranged to direct gas towards a film deposition area situated beyond the magnet, as considered from the microwave antenna.
申请公布号
EP1919264(A1)
申请公布日期
2008.05.07
申请号
EP20060301116
申请日期
2006.11.02
申请人
DOW CORNING CORPORATION;ECOLE POLYTECHNIQUE
发明人
ROCA I CABARROCAS, PERE;BULKIN, PAVEL;DAINEKA, DMITRI;LEEMPOEL, PATRICK;DESCAMPS, PIERRE;KERVYN DE MEERENDRE, THIBAULT