| 摘要 |
A susceptor with an RF generator is provided to improve cleaning effect before remained particles are removed, by preventing a process chamber from being contaminated due to wafer backside particles. A nitrogen tube(52) is formed along an edge portion of a susceptor(100), such that process remainders in a process chamber(20) are prevented from being stacked on the susceptor. A nitrogen barrier is formed on the edge portion of the susceptor. The nitrogen barrier prevents particles from the process chamber from permeating into the susceptor. The particles are removed from the susceptor through tiny eject holes and transferred to an ejection header in a susceptor arm(110). After the particles are removed from the susceptor, an RF cleaning process is performed to completely remove the particles. Electrical power from an RF generator(120) generates an RF(Radio Frequency) wave on a coil on the susceptor, such that the particles are completely removed.
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