发明名称 IN-PLANE SWITCHING MODE ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
摘要 An in-plane field type array substrate and its fabrication method are provided to enhance the luminance and contrast ratio performance by improving an aperture ratio. A TFT(Thin Film Transistor) having a gate electrode(111), a semiconductor layer(130), and source and drain electrodes(121,122) are formed on a substrate(100). A photosensitive organic material is coated on the entire surface of the substrate to form an organic film with a certain thickness. The organic film is patterned to form an organic film pattern(180) having an opening and a plurality of concave portions(181). A metal layer is formed on the organic film pattern. The metal layer is patterned to form a common electrode(151) on one of the concave portions and pixel electrodes(161), which electrically contact with the drain electrodes, on the other remaining concave portions and the opening.
申请公布号 KR20080038930(A) 申请公布日期 2008.05.07
申请号 KR20060106471 申请日期 2006.10.31
申请人 LG DISPLAY CO., LTD. 发明人 PARK, KI BOK
分类号 G02F1/136;G02F1/1343 主分类号 G02F1/136
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