发明名称 Processing device and method of maintaining the device
摘要 A film processing device using vaporized liquid source capable of confirming the flow control accuracy of flow control equipment such as a mass flow controller ( 15 ) controlling the flow of the liquid source without separating the flow control equipment from piping and disassembling the piping, comprising a bypass passage ( 41 ) for bypassing a part of a washing fluid feed passage ( 32 ) for feeding washing fluid to a liquid source feed passage ( 12 ) and a flowmeter such as an MFM ( 42 ), wherein the washing fluid is allowed to flow to the mass flow controller ( 15 ) through the MFM ( 42 ), and the flow of the washing fluid detected by the MFM ( 42 ) is compared with a target flow set in the mass flow controller ( 15 ) to check whether the mass flow controller ( 15 ) operates normally or not.
申请公布号 US7367350(B2) 申请公布日期 2008.05.06
申请号 US20040503126 申请日期 2004.08.09
申请人 TOKYO ELECTRON LIMITED 发明人 TORIYA DAISUKE;HOMMA KENJI;TSUKADA AKIHIKO;SHIMOMURA KOUJI
分类号 G01F1/00;G05D7/06;C23C16/44;C23C16/448;G01F25/00;H01L21/304;H01L21/31 主分类号 G01F1/00
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