| 摘要 |
An electrostatic chuck having excellent attracting power and holding power is provided. The electrostatic chuck is provided with a multilayer structure wherein a first insulating layer, a first electrode layer, an interelectrode insulating layer, a second electrode layer and a second insulating layer are successively stacked on a metal base from a level close to the metal base. The second electrode layer has a plurality of openings in a prescribed flat plane region. The electrostatic chuck is composed of a pattern electrode satisfying inequalities of L/X>=1.5 and L<2.6mm, where, X is a shortest distance between the adjoining openings, and L is a length of a line obtained by a foot of a perpendicular obtained when the gravity centers of the adjoining openings are projected to a virtual line parallel to the shortest distance X. |
