发明名称 Method for fabricating a transformer integrated with a semiconductor structure
摘要 A substrate is provided and a top interconnection metal layer and a primary winding layer are formed thereon. Then a passivation layer having a plurality of via exposed parts of the top interconnection metal layer is formed on the substrate. A secondary winding layer and at least a bonding pad are formed on the passivation layer. The bonding pad electrically connects to the top interconnection metal layer through the via.
申请公布号 US7367113(B2) 申请公布日期 2008.05.06
申请号 US20060278952 申请日期 2006.04.06
申请人 UNITED MICROELECTRONICS CORP. 发明人 HUNG CHENG-CHOU;TSENG HUA-CHOU;LIANG VICTOR-CHIANG;CHEN YU-CHIA;HSU TSUN-LAI
分类号 H01F41/02 主分类号 H01F41/02
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