BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING THE SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PROTECTIVE FILM, INTERLAYER DIELECTRIC, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT

摘要

A bis(aminophenol) derivative which is for use as a raw material for polyamide resins for use in positive photosensitive resin compositions, characterized by having a substituent in each of positions respectively adjoining to the two amino groups; and a polyamide resin comprising a bis(aminophenol) characterized by having a substituent in each of positions respectively adjoining to the two amino groups and a structure derived from a carboxylic acid. Also provided are: a positive photosensitive resin composition containing a polybenzoxazole precursor resin which has high sensitivity and comes to have a high degree of cyclization even when cured at a low temperature; and a positive photosensitive resin composition containing a polyamide resin which has an imide structure, imide precursor structure, or amic acid ester structure and which has high sensitivity and comes to have a low water absorption even when cured at a low temperature.