| 摘要 |
A beam aperture deflector of an ion implanter is provided to maximize usage efficiency of an ion beam by guiding the ion beam into the ion implanter using an electrical field. A beam aperture deflector prevents an ion beam from diverging outside a beam guide and includes a body unit(110), a guiding wing(120), and an insulation member(130). A through-hole is formed on a center of the body unit. The ion beam passes through the through-hole. The guiding wings are formed on an upper surface of the body unit apart from each other. Positive voltages are applied on the guiding wings. The insulation member is inserted into a junction between the body unit and the guiding wing. The insulation member is made of a synthetic resin.
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