发明名称 INDUCTIVELY COUPLED PLASMA REACTOR WITH MULTI ANTENNA AND MULTI ANTENNA DRIVING SYSTEM
摘要 An inductively coupled plasma reactor having multi antenna and a multi antenna driving system for the same are provided to generate uniform high density plasma inside a vacuum chamber by operating the multi antenna with a current balancing circuit. An inductively coupled plasma reactor comprises a plurality of radio frequency antennas(321), a vacuum chamber(300), a dielectric window(323), and a magnetic core cover(322). The vacuum chamber has a substrate supporting part(330) which a processed substrate(W) is mounted on. The dielectric window is installed in the upper part of the vacuum chamber and has a trench area(327). The plurality of the radio frequency antennas are installed on an upper side of the trench area. The magnetic core cover is installed in the trench area to be covered along the plurality of the radio frequency antennas and to enable a magnetic flux inlet to face an inside of the vacuum chamber.
申请公布号 KR20080037917(A) 申请公布日期 2008.05.02
申请号 KR20060105197 申请日期 2006.10.27
申请人 NEW POWER PLASMA CO., LTD. 发明人 CHOI, DAI KYU;WI, SOON IM;CHOE, SANG DON
分类号 H05H1/34 主分类号 H05H1/34
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