MIXED CHROMIUM OXIDE-CHROMIUM METAL SPUTTERING TARGET

摘要

An AC or DC sputtering target for depositing thin films of chromium sub o xides on a substrate contains oxides of chromium, chromium metal and incorpo rated oxygen. The target has a resistivity of 200 ohm. cm or less. The targe t can be made from a combination of oxides of chromium powder and chromium m etal, such as in powder form, or can be made starting with 100% chromium oxi de or sub oxide material that is subjected to a reducing atmosphere either b efore or during the process of making the target in order to reduce a fracti on of the chromium oxide and/or sub oxide material to chromium metal and ret ained oxygen. Such a target can enable the sputtering process to be conducte d using inert argon gas only to yield a thin film of chromium oxide.